Real-time analysis and control of plasma etching via full wafer interferometry

Real-time analysis and control of plasma etching via full wafer interferometry

Thesis (Ph. D.)--Massachusetts Institute of Technology, Dept. of Mechanical Engineering, 1996. === Includes bibliographical references (p. 132-137). === by Ka Shun Wong. === Ph.D.

Bibliographic Details
Main Author: Wong, Ka Shun
Other Authors: Duane S. Boning.
Format: Others
Language:English
Published: Massachusetts Institute of Technology 2005
Subjects:
Mechanical Engineering
Online Access:http://hdl.handle.net/1721.1/10682

Internet

http://hdl.handle.net/1721.1/10682

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