The effects of deposition parameters on hydrogenated amorphous silicon films fabricated by microwave glow discharge techniques

The effects of deposition parameters on hydrogenated amorphous silicon films fabricated by microwave glow discharge techniques

Bibliographic Details
Main Author: Mejia Zenteno, Sergio Ruperto Tadeo.
Published: 2014
Online Access:http://hdl.handle.net/1993/28702
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spelling ndltd-MANITOBA-oai-mspace.lib.umanitoba.ca-1993-287022014-11-26T15:44:13Z The effects of deposition parameters on hydrogenated amorphous silicon films fabricated by microwave glow discharge techniques Mejia Zenteno, Sergio Ruperto Tadeo. 2014-11-24T15:21:59Z 2014-11-24T15:21:59Z 1984 http://hdl.handle.net/1993/28702
collection NDLTD
sources NDLTD
description
author Mejia Zenteno, Sergio Ruperto Tadeo.
spellingShingle Mejia Zenteno, Sergio Ruperto Tadeo.
The effects of deposition parameters on hydrogenated amorphous silicon films fabricated by microwave glow discharge techniques
author_facet Mejia Zenteno, Sergio Ruperto Tadeo.
author_sort Mejia Zenteno, Sergio Ruperto Tadeo.
title The effects of deposition parameters on hydrogenated amorphous silicon films fabricated by microwave glow discharge techniques
title_short The effects of deposition parameters on hydrogenated amorphous silicon films fabricated by microwave glow discharge techniques
title_full The effects of deposition parameters on hydrogenated amorphous silicon films fabricated by microwave glow discharge techniques
title_fullStr The effects of deposition parameters on hydrogenated amorphous silicon films fabricated by microwave glow discharge techniques
title_full_unstemmed The effects of deposition parameters on hydrogenated amorphous silicon films fabricated by microwave glow discharge techniques
title_sort effects of deposition parameters on hydrogenated amorphous silicon films fabricated by microwave glow discharge techniques
publishDate 2014
url http://hdl.handle.net/1993/28702
work_keys_str_mv AT mejiazentenosergiorupertotadeo theeffectsofdepositionparametersonhydrogenatedamorphoussiliconfilmsfabricatedbymicrowaveglowdischargetechniques
AT mejiazentenosergiorupertotadeo effectsofdepositionparametersonhydrogenatedamorphoussiliconfilmsfabricatedbymicrowaveglowdischargetechniques
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