The effects of deposition parameters on hydrogenated amorphous silicon films fabricated by microwave glow discharge techniques
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Published: |
2014
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Online Access: | http://hdl.handle.net/1993/28702 |
Summary: |
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Main Author: | |
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Published: |
2014
|
Online Access: | http://hdl.handle.net/1993/28702 |
Summary: |
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