Interference assisted laser induced forward transfer for line patterning

Biomedical and microelectronic devices such as microinjectors and interconnects require line patterns to be fabricated on their surface. The process to pattern such surfaces should consider the requirements such as chemical inertness and biocompatibility. Laser Induced Forward Transfer (LIFT) is a s...

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Main Author: Shah, Ankur
Format: Others
Published: 2008
Online Access:http://spectrum.library.concordia.ca/976250/1/MR45475.pdf
Shah, Ankur <http://spectrum.library.concordia.ca/view/creators/Shah=3AAnkur=3A=3A.html> (2008) Interference assisted laser induced forward transfer for line patterning. Masters thesis, Concordia University.
id ndltd-LACETR-oai-collectionscanada.gc.ca-QMG.976250
record_format oai_dc
spelling ndltd-LACETR-oai-collectionscanada.gc.ca-QMG.9762502013-10-22T03:47:51Z Interference assisted laser induced forward transfer for line patterning Shah, Ankur Biomedical and microelectronic devices such as microinjectors and interconnects require line patterns to be fabricated on their surface. The process to pattern such surfaces should consider the requirements such as chemical inertness and biocompatibility. Laser Induced Forward Transfer (LIFT) is a simple direct write technique which offers the ability to pattern a substrate by localized deposition of material. In LIFT, a laser beam is focused through donor substrate (DS) coated with thin film to deposit on the acceptor substrate (AS) to be patterned. In this research project, a new laser based micropatterning method combining LIFT and laser interferometry for depositing periodic line patterns on a substrate has been proposed. Considering biocompatibility, glass has been selected as the acceptor substrate where a laser beam was focused on a gold film to get deposited on it. Theoretical modeling has been done to predict the laser and optical parameters on the dimensions of the gold line patterns. Also the effect of refractive index and thickness of the DS on the patterned dimensions has been analyzed. Experiments were done to deposit patterns of widths ranging from 4 to 10 o m with the pitch between 8 and 20 o m . Experiments were also done by varying the feed rate and dwell time of scanning to achieve continuity in deposition and up to 700 o m length i.e. three times the focused spot size have been deposited. With the proposed method, pattern dimensions on the substrate can be easily modified by making simple changes to the optical setup 2008 Thesis NonPeerReviewed application/pdf http://spectrum.library.concordia.ca/976250/1/MR45475.pdf Shah, Ankur <http://spectrum.library.concordia.ca/view/creators/Shah=3AAnkur=3A=3A.html> (2008) Interference assisted laser induced forward transfer for line patterning. Masters thesis, Concordia University. http://spectrum.library.concordia.ca/976250/
collection NDLTD
format Others
sources NDLTD
description Biomedical and microelectronic devices such as microinjectors and interconnects require line patterns to be fabricated on their surface. The process to pattern such surfaces should consider the requirements such as chemical inertness and biocompatibility. Laser Induced Forward Transfer (LIFT) is a simple direct write technique which offers the ability to pattern a substrate by localized deposition of material. In LIFT, a laser beam is focused through donor substrate (DS) coated with thin film to deposit on the acceptor substrate (AS) to be patterned. In this research project, a new laser based micropatterning method combining LIFT and laser interferometry for depositing periodic line patterns on a substrate has been proposed. Considering biocompatibility, glass has been selected as the acceptor substrate where a laser beam was focused on a gold film to get deposited on it. Theoretical modeling has been done to predict the laser and optical parameters on the dimensions of the gold line patterns. Also the effect of refractive index and thickness of the DS on the patterned dimensions has been analyzed. Experiments were done to deposit patterns of widths ranging from 4 to 10 o m with the pitch between 8 and 20 o m . Experiments were also done by varying the feed rate and dwell time of scanning to achieve continuity in deposition and up to 700 o m length i.e. three times the focused spot size have been deposited. With the proposed method, pattern dimensions on the substrate can be easily modified by making simple changes to the optical setup
author Shah, Ankur
spellingShingle Shah, Ankur
Interference assisted laser induced forward transfer for line patterning
author_facet Shah, Ankur
author_sort Shah, Ankur
title Interference assisted laser induced forward transfer for line patterning
title_short Interference assisted laser induced forward transfer for line patterning
title_full Interference assisted laser induced forward transfer for line patterning
title_fullStr Interference assisted laser induced forward transfer for line patterning
title_full_unstemmed Interference assisted laser induced forward transfer for line patterning
title_sort interference assisted laser induced forward transfer for line patterning
publishDate 2008
url http://spectrum.library.concordia.ca/976250/1/MR45475.pdf
Shah, Ankur <http://spectrum.library.concordia.ca/view/creators/Shah=3AAnkur=3A=3A.html> (2008) Interference assisted laser induced forward transfer for line patterning. Masters thesis, Concordia University.
work_keys_str_mv AT shahankur interferenceassistedlaserinducedforwardtransferforlinepatterning
_version_ 1716608120205082624