Filmes finos de carbono depositados por meio da técnica de magnetron sputtering usando cobalto, cobre e níquel como buffer-layers

Filmes finos de carbono depositados por meio da técnica de magnetron sputtering usando cobalto, cobre e níquel como buffer-layers

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Submitted by Maria Eneide de Souza Araujo (mearaujo@ipen.br) on 2015-10-08T12:18:50Z No. of bitstreams: 0 === Made available in DSpace on 2015-10-08T12:18:50Z (GMT). No. of bitstreams: 0 === Dissertação (Mestrado em Tecnologia Nuclear) === IPEN/D === Instituto de Pesquisas Energeticas e Nucleares -...

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Bibliographic Details
Main Author:	COSTA e SILVA, DANILO L.
Other Authors:	Orientador: Marina Fuser Pillis
Format:	Others
Published:	2015
Subjects:	THIN FILMS CARBON MAGNETRONS SPUTTERING COBALT COPPER NICKEL BUFFERS LAYERS X-RAY DIFFRACTION SCANNING EKLECTRON MICROSCOPY TRANSMISSION ELECTRON MICROSCOPY
Online Access:	http://repositorio.ipen.br:8080/xmlui/handle/123456789/23916

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