Laplace transform deep level transient spectroscopic study on PLD grown ZnO
The fundamental physics and techniques employed in Laplace transform deep level transient spectroscopy (L-DLTS) are reviewed. A Laplace-DLTS system has been constructed. The high resolving power of this system has been demonstrated experimentally. The L-DLTS system was applied to characterize the...
Main Authors: | , |
---|---|
Language: | English |
Published: |
The University of Hong Kong (Pokfulam, Hong Kong)
2015
|
Subjects: | |
Online Access: | http://hdl.handle.net/10722/211117 |
id |
ndltd-HKU-oai-hub.hku.hk-10722-211117 |
---|---|
record_format |
oai_dc |
spelling |
ndltd-HKU-oai-hub.hku.hk-10722-2111172015-07-29T04:03:05Z Laplace transform deep level transient spectroscopic study on PLD grown ZnO Ho, Lok-ping 何樂平 Laplace transformation Zinc oxide - Defects Deep level transient spectroscopy The fundamental physics and techniques employed in Laplace transform deep level transient spectroscopy (L-DLTS) are reviewed. A Laplace-DLTS system has been constructed. The high resolving power of this system has been demonstrated experimentally. The L-DLTS system was applied to characterize the defects in undoped n-type ZnO thin film grown by the pulsed laser deposition (PLD) method. A 0.3 eV deep trap has been identified. The formations of Ec-0.39eV and Ec-0.20eVcan be enhanced when the sample surface is seriously damaged by high temperature annealing.AnEc-0.25eV trap is identified in the freshly grown samples, but would disappear after the storage of 3 months. Copper doped n-type ZnO thin film samples with low carrier concentration (n~〖10〗^16 〖cm〗^(-3)) were investigated by using both conventional and Laplace DLTS techniques. Positive DLTS signal peaks were detected that are suspected to be contributed by the minority carrier (hole carrier) emission. A physics model involving the inversion layer of a metal-insulator-semiconductor contact has been invoked to interpret the hole carrier concentration existing near the metal-semiconductor interface. Expression for the defect concentration is determined as a function of the temperature of DLTS peaks. AnEv+0.6eV defect with high concentration (N_T~〖10〗^17 〖cm〗^(-3)) was detected. The concentration of Ev+0.6eVcan be enhanced when the annealing temperature was increased from 750 to 900 degree C. published_or_final_version Physics Master Master of Philosophy 2015-07-07T23:10:41Z 2015-07-07T23:10:41Z 2015 PG_Thesis b5481905 http://hdl.handle.net/10722/211117 eng HKU Theses Online (HKUTO) The author retains all proprietary rights, (such as patent rights) and the right to use in future works. Creative Commons: Attribution 3.0 Hong Kong License The University of Hong Kong (Pokfulam, Hong Kong) |
collection |
NDLTD |
language |
English |
sources |
NDLTD |
topic |
Laplace transformation Zinc oxide - Defects Deep level transient spectroscopy |
spellingShingle |
Laplace transformation Zinc oxide - Defects Deep level transient spectroscopy Ho, Lok-ping 何樂平 Laplace transform deep level transient spectroscopic study on PLD grown ZnO |
description |
The fundamental physics and techniques employed in Laplace transform deep level transient spectroscopy (L-DLTS) are reviewed. A Laplace-DLTS system has been constructed. The high resolving power of this system has been demonstrated experimentally.
The L-DLTS system was applied to characterize the defects in undoped n-type ZnO thin film grown by the pulsed laser deposition (PLD) method. A 0.3 eV deep trap has been identified. The formations of Ec-0.39eV and Ec-0.20eVcan be enhanced when the sample surface is seriously damaged by high temperature annealing.AnEc-0.25eV trap is identified in the freshly grown samples, but would disappear after the storage of 3 months.
Copper doped n-type ZnO thin film samples with low carrier concentration (n~〖10〗^16 〖cm〗^(-3)) were investigated by using both conventional and Laplace DLTS techniques. Positive DLTS signal peaks were detected that are suspected to be contributed by the minority carrier (hole carrier) emission. A physics model involving the inversion layer of a metal-insulator-semiconductor contact has been invoked to interpret the hole carrier concentration existing near the metal-semiconductor interface. Expression for the defect concentration is determined as a function of the temperature of DLTS peaks. AnEv+0.6eV defect with high concentration (N_T~〖10〗^17 〖cm〗^(-3)) was detected. The concentration of Ev+0.6eVcan be enhanced when the annealing temperature was increased from 750 to 900 degree C. === published_or_final_version === Physics === Master === Master of Philosophy |
author |
Ho, Lok-ping 何樂平 |
author_facet |
Ho, Lok-ping 何樂平 |
author_sort |
Ho, Lok-ping |
title |
Laplace transform deep level transient spectroscopic study on PLD grown ZnO |
title_short |
Laplace transform deep level transient spectroscopic study on PLD grown ZnO |
title_full |
Laplace transform deep level transient spectroscopic study on PLD grown ZnO |
title_fullStr |
Laplace transform deep level transient spectroscopic study on PLD grown ZnO |
title_full_unstemmed |
Laplace transform deep level transient spectroscopic study on PLD grown ZnO |
title_sort |
laplace transform deep level transient spectroscopic study on pld grown zno |
publisher |
The University of Hong Kong (Pokfulam, Hong Kong) |
publishDate |
2015 |
url |
http://hdl.handle.net/10722/211117 |
work_keys_str_mv |
AT holokping laplacetransformdeepleveltransientspectroscopicstudyonpldgrownzno AT hélèpíng laplacetransformdeepleveltransientspectroscopicstudyonpldgrownzno |
_version_ |
1716814842955825152 |