Laplace transform deep level transient spectroscopic study on PLD grown ZnO

The fundamental physics and techniques employed in Laplace transform deep level transient spectroscopy (L-DLTS) are reviewed. A Laplace-DLTS system has been constructed. The high resolving power of this system has been demonstrated experimentally. The L-DLTS system was applied to characterize the...

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Main Authors: Ho, Lok-ping, 何樂平
Language:English
Published: The University of Hong Kong (Pokfulam, Hong Kong) 2015
Subjects:
Online Access:http://hdl.handle.net/10722/211117
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spelling ndltd-HKU-oai-hub.hku.hk-10722-2111172015-07-29T04:03:05Z Laplace transform deep level transient spectroscopic study on PLD grown ZnO Ho, Lok-ping 何樂平 Laplace transformation Zinc oxide - Defects Deep level transient spectroscopy The fundamental physics and techniques employed in Laplace transform deep level transient spectroscopy (L-DLTS) are reviewed. A Laplace-DLTS system has been constructed. The high resolving power of this system has been demonstrated experimentally. The L-DLTS system was applied to characterize the defects in undoped n-type ZnO thin film grown by the pulsed laser deposition (PLD) method. A 0.3 eV deep trap has been identified. The formations of Ec-0.39eV and Ec-0.20eVcan be enhanced when the sample surface is seriously damaged by high temperature annealing.AnEc-0.25eV trap is identified in the freshly grown samples, but would disappear after the storage of 3 months. Copper doped n-type ZnO thin film samples with low carrier concentration (n~〖10〗^16 〖cm〗^(-3)) were investigated by using both conventional and Laplace DLTS techniques. Positive DLTS signal peaks were detected that are suspected to be contributed by the minority carrier (hole carrier) emission. A physics model involving the inversion layer of a metal-insulator-semiconductor contact has been invoked to interpret the hole carrier concentration existing near the metal-semiconductor interface. Expression for the defect concentration is determined as a function of the temperature of DLTS peaks. AnEv+0.6eV defect with high concentration (N_T~〖10〗^17 〖cm〗^(-3)) was detected. The concentration of Ev+0.6eVcan be enhanced when the annealing temperature was increased from 750 to 900 degree C. published_or_final_version Physics Master Master of Philosophy 2015-07-07T23:10:41Z 2015-07-07T23:10:41Z 2015 PG_Thesis b5481905 http://hdl.handle.net/10722/211117 eng HKU Theses Online (HKUTO) The author retains all proprietary rights, (such as patent rights) and the right to use in future works. Creative Commons: Attribution 3.0 Hong Kong License The University of Hong Kong (Pokfulam, Hong Kong)
collection NDLTD
language English
sources NDLTD
topic Laplace transformation
Zinc oxide - Defects
Deep level transient spectroscopy
spellingShingle Laplace transformation
Zinc oxide - Defects
Deep level transient spectroscopy
Ho, Lok-ping
何樂平
Laplace transform deep level transient spectroscopic study on PLD grown ZnO
description The fundamental physics and techniques employed in Laplace transform deep level transient spectroscopy (L-DLTS) are reviewed. A Laplace-DLTS system has been constructed. The high resolving power of this system has been demonstrated experimentally. The L-DLTS system was applied to characterize the defects in undoped n-type ZnO thin film grown by the pulsed laser deposition (PLD) method. A 0.3 eV deep trap has been identified. The formations of Ec-0.39eV and Ec-0.20eVcan be enhanced when the sample surface is seriously damaged by high temperature annealing.AnEc-0.25eV trap is identified in the freshly grown samples, but would disappear after the storage of 3 months. Copper doped n-type ZnO thin film samples with low carrier concentration (n~〖10〗^16 〖cm〗^(-3)) were investigated by using both conventional and Laplace DLTS techniques. Positive DLTS signal peaks were detected that are suspected to be contributed by the minority carrier (hole carrier) emission. A physics model involving the inversion layer of a metal-insulator-semiconductor contact has been invoked to interpret the hole carrier concentration existing near the metal-semiconductor interface. Expression for the defect concentration is determined as a function of the temperature of DLTS peaks. AnEv+0.6eV defect with high concentration (N_T~〖10〗^17 〖cm〗^(-3)) was detected. The concentration of Ev+0.6eVcan be enhanced when the annealing temperature was increased from 750 to 900 degree C. === published_or_final_version === Physics === Master === Master of Philosophy
author Ho, Lok-ping
何樂平
author_facet Ho, Lok-ping
何樂平
author_sort Ho, Lok-ping
title Laplace transform deep level transient spectroscopic study on PLD grown ZnO
title_short Laplace transform deep level transient spectroscopic study on PLD grown ZnO
title_full Laplace transform deep level transient spectroscopic study on PLD grown ZnO
title_fullStr Laplace transform deep level transient spectroscopic study on PLD grown ZnO
title_full_unstemmed Laplace transform deep level transient spectroscopic study on PLD grown ZnO
title_sort laplace transform deep level transient spectroscopic study on pld grown zno
publisher The University of Hong Kong (Pokfulam, Hong Kong)
publishDate 2015
url http://hdl.handle.net/10722/211117
work_keys_str_mv AT holokping laplacetransformdeepleveltransientspectroscopicstudyonpldgrownzno
AT hélèpíng laplacetransformdeepleveltransientspectroscopicstudyonpldgrownzno
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