Chemical vapor deposition and characterization of zirconium tin titanate as a high dielectric constant material for potential electronic applications
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Georgia Institute of Technology
2005
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Online Access: | http://hdl.handle.net/1853/5422 |
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ndltd-GATECH-oai-smartech.gatech.edu-1853-54222013-01-07T20:11:22ZChemical vapor deposition and characterization of zirconium tin titanate as a high dielectric constant material for potential electronic applicationsMays, Ebony LynnZirconium alloys AnalysisThin filmsChemical vapor depositionDielectricsZirconium alloys AnalysisChemical vapor depositionDielectricsThin filmsGeorgia Institute of Technology2005-03-10T18:45:47Z2005-03-10T18:45:47Z2003-12-01Dissertation11424382 bytesapplication/pdfhttp://hdl.handle.net/1853/5422en_US |
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language |
en_US |
format |
Others
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NDLTD |
topic |
Zirconium alloys Analysis Thin films Chemical vapor deposition Dielectrics Zirconium alloys Analysis Chemical vapor deposition Dielectrics Thin films |
spellingShingle |
Zirconium alloys Analysis Thin films Chemical vapor deposition Dielectrics Zirconium alloys Analysis Chemical vapor deposition Dielectrics Thin films Mays, Ebony Lynn Chemical vapor deposition and characterization of zirconium tin titanate as a high dielectric constant material for potential electronic applications |
author |
Mays, Ebony Lynn |
author_facet |
Mays, Ebony Lynn |
author_sort |
Mays, Ebony Lynn |
title |
Chemical vapor deposition and characterization of zirconium tin titanate as a high dielectric constant material for potential electronic applications |
title_short |
Chemical vapor deposition and characterization of zirconium tin titanate as a high dielectric constant material for potential electronic applications |
title_full |
Chemical vapor deposition and characterization of zirconium tin titanate as a high dielectric constant material for potential electronic applications |
title_fullStr |
Chemical vapor deposition and characterization of zirconium tin titanate as a high dielectric constant material for potential electronic applications |
title_full_unstemmed |
Chemical vapor deposition and characterization of zirconium tin titanate as a high dielectric constant material for potential electronic applications |
title_sort |
chemical vapor deposition and characterization of zirconium tin titanate as a high dielectric constant material for potential electronic applications |
publisher |
Georgia Institute of Technology |
publishDate |
2005 |
url |
http://hdl.handle.net/1853/5422 |
work_keys_str_mv |
AT maysebonylynn chemicalvapordepositionandcharacterizationofzirconiumtintitanateasahighdielectricconstantmaterialforpotentialelectronicapplications |
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1716474023231094784 |