Resist and Residue Removal Using Gas-Expanded Liquids
Each new generation of integrated circuits and other nano-structured devices is produced at ever decreasing length scales. The extension of conventional liquid-phase processes for the manufacturing of these devices is uncertain. This work investigates the ability of liquids to wet nanoscale feature...
| Main Author: | |
|---|---|
| Format: | Others |
| Language: | en_US |
| Published: |
Georgia Institute of Technology
2005
|
| Subjects: | |
| Online Access: | http://hdl.handle.net/1853/5272 |