Modeling and process planning for exposure controlled projection lithography
A novel approach to microfabrication based on stereolithography was presented. This fabrication process is referred to as, ‘Exposure Controlled Projection Lithography’ (ECPL). In the ECPL process, incident radiation, patterned by a dynamic mask, passes through a transparent substrate to cure photopo...
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| Language: | en_US |
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Georgia Institute of Technology
2014
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| Online Access: | http://hdl.handle.net/1853/51929 |