Influence of frequency and environment on the fatigue behavior of monocrystalline silicon thin films
Understanding the mechanisms for fatigue crack initiation and propagation in micron-scale silicon (Si) is of great importance to assess and improve the reliability of Si based microelectromechanical systems (MEMS) in harsh environments. Accordingly, this investigation studies the fatigue properties...
Main Author: | Theillet, Pierre-Olivier |
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Published: |
Georgia Institute of Technology
2010
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Subjects: | |
Online Access: | http://hdl.handle.net/1853/33957 |
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