The study of alternating flow chemical vapor infiltration and a novel kinetics determination technique for the vapor deposition of silicon carbide via the decomposition of methyltrichlorosilane
| Main Author: | |
|---|---|
| Published: |
Georgia Institute of Technology
2008
|
| Subjects: | |
| Online Access: | http://hdl.handle.net/1853/19991 |
| Description not available. |