A method of determining the high frequency dielectric properties of thin films using in-situ structures
Main Author: | Laursen, Kirk Garrett |
---|---|
Format: | Others |
Language: | en_US |
Published: |
Georgia Institute of Technology
2007
|
Subjects: | |
Online Access: | http://hdl.handle.net/1853/13844 |
Similar Items
-
Properties of thin yttrium oxide dielectric films.
by: Riemann, Ernest B.
Published: (2011) -
THREE TECHNIQUES FOR DETERMINING THE OPTICAL CONSTANTS OF DIELECTRIC THIN FILMS
by: Garcia, Marie Frances, 1949-
Published: (1986) -
Nanometer scale electrical characterization of thin dielectric films /
by: Lee, David Timothy.
Published: (2002) -
Dielectric properties of thin films based on CeO2̲
by: Al-Dhhan, Z. T.
Published: (1988) -
Dielectric properties of thin films based on CeO2̲ and TeO2̲
by: Khleif, W. I.
Published: (1989)