The composition and properties of PECVD silicon dioxide

Bibliographic Details
Main Author:	Ceiler, Martin Francis, Jr.
Format:	Others
Language:	en_US
Published:	Georgia Institute of Technology 2006
Subjects:	Silica
Online Access:	http://hdl.handle.net/1853/11864

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spelling	ndltd-GATECH-oai-smartech.gatech.edu-1853-118642013-12-15T03:32:43ZThe composition and properties of PECVD silicon dioxideCeiler, Martin Francis, Jr.SilicaGeorgia Institute of Technology2006-09-19T18:03:17Z2006-09-19T18:03:17Z1993-12Thesis239 bytestext/htmlhttp://hdl.handle.net/1853/11864379832en_USAccess restricted to authorized Georgia Tech users only.
collection	NDLTD
language	en_US
format	Others
sources	NDLTD
topic	Silica
spellingShingle	Silica Ceiler, Martin Francis, Jr. The composition and properties of PECVD silicon dioxide
author	Ceiler, Martin Francis, Jr.
author_facet	Ceiler, Martin Francis, Jr.
author_sort	Ceiler, Martin Francis, Jr.
title	The composition and properties of PECVD silicon dioxide
title_short	The composition and properties of PECVD silicon dioxide
title_full	The composition and properties of PECVD silicon dioxide
title_fullStr	The composition and properties of PECVD silicon dioxide
title_full_unstemmed	The composition and properties of PECVD silicon dioxide
title_sort	composition and properties of pecvd silicon dioxide
publisher	Georgia Institute of Technology
publishDate	2006
url	http://hdl.handle.net/1853/11864
work_keys_str_mv	AT ceilermartinfrancisjr thecompositionandpropertiesofpecvdsilicondioxide AT ceilermartinfrancisjr compositionandpropertiesofpecvdsilicondioxide
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