Quantitative study of near equilibrium in dissociative mechanism of nickel in silicon
The dissociative mechanism of nickel in silicon has been studied experimentally, assuming the near equilibrium represented by CiCV / Cs = Ci eq C eq / Cs eq , where subscripts i, V, and s represent interstitial nickel atoms, vacancies, and substitutional nickel atoms, respectively, superscript eq r...
Main Authors: | Yoshida, Masayuki, Kitagawa, Hajime, Morooka, Masami, Tanaka, Shuji |
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Other Authors: | Yoshida Semiconductor Laboratory, |
Format: | Article |
Language: | English |
Published: |
Universitätsbibliothek Leipzig
2016
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Subjects: | |
Online Access: | http://nbn-resolving.de/urn:nbn:de:bsz:15-qucosa-192796 http://nbn-resolving.de/urn:nbn:de:bsz:15-qucosa-192796 http://www.qucosa.de/fileadmin/data/qucosa/documents/19279/diff_fund_9%282009%294.pdf |
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