ICP Etching of Silicon for Micro and Nanoscale Devices

ICP Etching of Silicon for Micro and Nanoscale Devices

<p>The physical structuring of silicon is one of the cornerstones of modern microelectronics and integrated circuits. Typical structuring of silicon requires generating a plasma to chemically or physically etch silicon. Although many tools have been created to do this, the most finely honed...

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Bibliographic Details
Main Author: Henry, Michael David
Format: Others
Published: 2010
Online Access:https://thesis.library.caltech.edu/5846/2/MDH-Thesis-Rev1.pdf
Henry, Michael David (2010) ICP Etching of Silicon for Micro and Nanoscale Devices. Dissertation (Ph.D.), California Institute of Technology. doi:10.7907/Z9MW2FBC. https://resolver.caltech.edu/CaltechTHESIS:05262010-152815609 <https://resolver.caltech.edu/CaltechTHESIS:05262010-152815609>

Internet

https://thesis.library.caltech.edu/5846/2/MDH-Thesis-Rev1.pdf
Henry, Michael David (2010) ICP Etching of Silicon for Micro and Nanoscale Devices. Dissertation (Ph.D.), California Institute of Technology. doi:10.7907/Z9MW2FBC. https://resolver.caltech.edu/CaltechTHESIS:05262010-152815609 <https://resolver.caltech.edu/CaltechTHESIS:05262010-152815609>

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