Development of Fluorinated Monomers and Polymers for Advanced Photolithographic Applications
<p>The incorporation of fluorine into photoresist materials imparts a variety of highly desirable properties for deep ultraviolet lithography at 193 nm and 157 nm. Chief amongst these benefits are the high optical transparency of partially fluorinated materials and the high acidity of fluoroc...
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https://thesis.library.caltech.edu/4899/12/Sanders_THESIS.pdfhttps://thesis.library.caltech.edu/4899/11/Sanders_INTRO.pdf
https://thesis.library.caltech.edu/4899/1/Sanders_350wordABSTRACT.pdf
https://thesis.library.caltech.edu/4899/4/Sanders_CHAPTER1.pdf
https://thesis.library.caltech.edu/4899/5/Sanders_CHAPTER2.pdf
https://thesis.library.caltech.edu/4899/6/Sanders_CHAPTER3.pdf
https://thesis.library.caltech.edu/4899/7/Sanders_CHAPTER4.pdf
https://thesis.library.caltech.edu/4899/8/Sanders_CHAPTER5.pdf
https://thesis.library.caltech.edu/4899/9/Sanders_CHAPTER6.pdf
https://thesis.library.caltech.edu/4899/10/Sanders_CHAPTER7.pdf
https://thesis.library.caltech.edu/4899/2/Sanders_APPENDIXA.pdf
https://thesis.library.caltech.edu/4899/3/Sanders_APPENDIXB.pdf
Sanders, Daniel Paul (2005) Development of Fluorinated Monomers and Polymers for Advanced Photolithographic Applications. Dissertation (Ph.D.), California Institute of Technology. doi:10.7907/g8b9-hh25. https://resolver.caltech.edu/CaltechETD:etd-12092004-165229 <https://resolver.caltech.edu/CaltechETD:etd-12092004-165229>