Development of apertureless microscopy and force microscopy of GaN and CeO22
NOTE: Text or symbols not renderable in plain ASCII are indicated by [...]. Abstract is included in .pdf document. This thesis concentrates on the development of both novel scanning probes as well as novel applications of existing ones in three major areas. The first area is our development of ape...
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Format: | Others |
Language: | en |
Published: |
1999
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Online Access: | https://thesis.library.caltech.edu/4057/1/Bridger_pm_1999.pdf Bridger, Paul M. (1999) Development of apertureless microscopy and force microscopy of GaN and CeO22. Dissertation (Ph.D.), California Institute of Technology. doi:10.7907/8ybw-sh03. https://resolver.caltech.edu/CaltechETD:etd-10122007-132811 <https://resolver.caltech.edu/CaltechETD:etd-10122007-132811> |
Summary: | NOTE: Text or symbols not renderable in plain ASCII are indicated by [...]. Abstract is included in .pdf document.
This thesis concentrates on the development of both novel scanning probes as well as
novel applications of existing ones in three major areas. The first area is our development of apertureless microscopy and progress toward our goal of 1nm optical imaging
and spectroscopy. Fundamental experiments and simulations of the apertureless imaging mechanism were conducted using nanosphere size standards. Fifteen nanometer
resolution as well as optical property discrimination was demonstrated. The apertureless microscope was then used to investigate the near field optical structure of
chromosomes and anti-reflective polymer thin films. The second area is the investigation of the electronic properties of the wide bandgap semiconductor GaN by atomic
force microscopy. Defects in GaN were correlated to diffusion lengths as measured by
electron beam induced current. Electric force microscopy (EFM), a varient of atomic
force microscopy, was subsequently used to investigate sub [...] electric field gradient
and surface potential variation associated with these defects. A novel application of
EFM to measure the surface state density was also demonstrated. The third area
is another novel application of EFM for localized charge storage in double barrier
Ce02/Si/Ce02/Si structures which may have relevance for data storage and charge
directed lithography.
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