Nanofabrication on unconventional substrates using transferred hard masks

Nanofabrication on unconventional substrates using transferred hard masks

A major challenge in nanofabrication is to pattern unconventional substrates that cannot be processed for a variety of reasons, such as incompatibility with spin coating, electron beam lithography, optical lithography, or wet chemical steps. Here, we present a versatile nanofabrication method based...

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Bibliographic Details
Main Authors: Li, Luozhou (Contributor), Bayn, Igal (Contributor), Lu, Ming (Author), Nam, Chang-Yong (Author), Stein, Aaron (Author), Schroder, Tim (Contributor), Harris, Nicholas Christopher (Contributor), Englund, Dirk Robert (Contributor)
Other Authors: Massachusetts Institute of Technology. Department of Electrical Engineering and Computer Science (Contributor), Massachusetts Institute of Technology. Research Laboratory of Electronics (Contributor)
Format: Article
Language:English
Published: Nature Publishing Group, 2015-02-17T15:14:37Z.
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