Design rules for self-assembled block copolymer patterns using tiled templates

Directed self-assembly of block copolymers has been used for fabricating various nanoscale patterns, ranging from periodic lines to simple bends. However, assemblies of dense bends, junctions and line segments in a single pattern have not been achieved by using sparse templates, because no systemati...

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Bibliographic Details
Main Authors: Chang, Jae-Byum (Contributor), Choi, Hong Kyoon (Contributor), Hannon, Adam F. (Contributor), Alexander-Katz, Alfredo (Author), Ross, Caroline A. (Contributor), Berggren, Karl K (Author)
Other Authors: Massachusetts Institute of Technology. Department of Electrical Engineering and Computer Science (Contributor), Massachusetts Institute of Technology. Department of Materials Science and Engineering (Contributor), Program in Media Arts and Sciences (Massachusetts Institute of Technology) (Contributor), Alfredo-Katz, Alfredo (Contributor), Berggren, Karl K. (Contributor)
Format: Article
Language:English
Published: Nature Publishing Group, 2015-01-06T18:48:18Z.
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Summary:Directed self-assembly of block copolymers has been used for fabricating various nanoscale patterns, ranging from periodic lines to simple bends. However, assemblies of dense bends, junctions and line segments in a single pattern have not been achieved by using sparse templates, because no systematic template design methods for achieving such complex patterns existed. To direct a complex pattern by using a sparse template, the template needs to encode the key information contained in the final pattern, without being a simple copy of the pattern. Here we develop a set of topographic template tiles consisting of square lattices of posts with a restricted range of geometric features. The block copolymer patterns resulting from all tile arrangements are determined. By combining tiles in different ways, it is possible to predict a relatively simple template that will direct the formation of non-trivial block copolymer patterns, providing a new template design method for a complex block copolymer pattern.
Samsung Scholarship Foundation
Semiconductor Research Corporation
Tokyo Electron Limited
Taiwan Semicondcutor Manufacturing Company
National Science Foundation (U.S.) (Award DMR1234169)