Fabricating BRDFs at high spatial resolution using wave optics

Recent attempts to fabricate surfaces with custom reflectance functions boast impressive angular resolution, yet their spatial resolution is limited. In this paper we present a method to construct spatially varying reflectance at a high resolution of up to 220dpi, orders of magnitude greater than pr...

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Bibliographic Details
Main Authors: Levin, Anat (Author), Glasner, Daniel (Author), Xiong, Ying (Author), Matusik, Wojciech (Contributor), Zickler, Todd (Author), Durand, Fredo (Contributor), Freeman, William T. (Contributor)
Other Authors: Massachusetts Institute of Technology. Computer Science and Artificial Intelligence Laboratory (Contributor), Massachusetts Institute of Technology. Department of Electrical Engineering and Computer Science (Contributor)
Format: Article
Language:English
Published: Association for Computing Machinery (ACM), 2014-04-14T13:13:47Z.
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Online Access:Get fulltext
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100 1 0 |a Levin, Anat  |e author 
100 1 0 |a Massachusetts Institute of Technology. Computer Science and Artificial Intelligence Laboratory  |e contributor 
100 1 0 |a Massachusetts Institute of Technology. Department of Electrical Engineering and Computer Science  |e contributor 
100 1 0 |a Durand, Fredo  |e contributor 
100 1 0 |a Freeman, William T.  |e contributor 
100 1 0 |a Matusik, Wojciech  |e contributor 
700 1 0 |a Glasner, Daniel  |e author 
700 1 0 |a Xiong, Ying  |e author 
700 1 0 |a Matusik, Wojciech  |e author 
700 1 0 |a Zickler, Todd  |e author 
700 1 0 |a Durand, Fredo  |e author 
700 1 0 |a Freeman, William T.  |e author 
245 0 0 |a Fabricating BRDFs at high spatial resolution using wave optics 
260 |b Association for Computing Machinery (ACM),   |c 2014-04-14T13:13:47Z. 
856 |z Get fulltext  |u http://hdl.handle.net/1721.1/86140 
520 |a Recent attempts to fabricate surfaces with custom reflectance functions boast impressive angular resolution, yet their spatial resolution is limited. In this paper we present a method to construct spatially varying reflectance at a high resolution of up to 220dpi, orders of magnitude greater than previous attempts, albeit with a lower angular resolution. The resolution of previous approaches is limited by the machining, but more fundamentally, by the geometric optics model on which they are built. Beyond a certain scale geometric optics models break down and wave effects must be taken into account. We present an analysis of incoherent reflectance based on wave optics and gain important insights into reflectance design. We further suggest and demonstrate a practical method, which takes into account the limitations of existing micro-fabrication techniques such as photolithography to design and fabricate a range of reflection effects, based on wave interference. 
520 |a United States-Israel Binational Science Foundation 
520 |a Intel Corporation (Intel Collaborative Research Institute for Computational Intelligence) 
520 |a National Science Foundation (U.S.) (CGV 1116303) 
546 |a en_US 
655 7 |a Article 
773 |t ACM Transactions on Graphics