Analytical model for RF power performance of deeply scaled CMOS devices
This paper presents a first order model for RF power of deeply scaled CMOS. The model highlights the role of device on-resistance in determining the maximum RF power. We show excellent agreement between the model and the measured data on 45 nm CMOS devices across a wide range of device widths, under...
Main Authors: | Gogineni, Usha (Contributor), del Alamo, Jesus A. (Contributor), Valdes-Garcia, Alberto (Author) |
---|---|
Other Authors: | Massachusetts Institute of Technology. Department of Electrical Engineering and Computer Science (Contributor) |
Format: | Article |
Language: | English |
Published: |
Institute of Electrical and Electronics Engineers (IEEE),
2012-08-02T18:45:26Z.
|
Subjects: | |
Online Access: | Get fulltext |
Similar Items
-
Deeply scaled CMOS for RF power applications
by: Scholvin, Jörg, 1976-
Published: (2007) -
Modeling frequency response of 65 nm CMOS RF power devices
by: Gogineni, Usha, et al.
Published: (2010) -
Performance limits of RF power CMOS
by: Gogineni, Usha, 1975-
Published: (2011) -
RF power potential of 45 nm CMOS technology
by: Gogineni, Usha, et al.
Published: (2010) -
Effect of Substrate Contact Shape and Placement on RF Characteristics of 45 nm Low Power CMOS Devices
by: Jagannathan, Basanth, et al.
Published: (2010)