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01675 am a22002653u 4500 |
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60941 |
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|a dc
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|a Fedynyshyn, Theodore H.
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|a Lincoln Laboratory
|e contributor
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|a Fedynyshyn, Theodore H.
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|a Fedynyshyn, Theodore H.
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|a Goodman, Russell B.
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|a Cabral, Alberto
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|a Goodman, Russell B.
|e author
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|a Cabral, Alberto
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|a Tarrio, Charles
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|a Lucatorto, Thomas B.
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|a Polymer photochemistry at the EUV wavelength
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|b SPIE,
|c 2011-02-14T15:16:15Z.
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|z Get fulltext
|u http://hdl.handle.net/1721.1/60941
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|a The higher energy associated with extreme ultraviolet (EUV) radiation coupled with the high absorptivity of most organic polymers at these wavelengths should lead to increased excited state population and higher quantum yields of photoproducts. Polymers representative of those commonly employed in resists as well as some model polymers were selected for this study. Polymer photochemistry at EUV was catalogued as to the effect of absorbed 13.4-nm radiation on a polymer's quantum yield of chain scission (Φs) and crosslinking (Φx). In selected cases, the chain scission and crosslinking quantum yields were also compared to those previously determined at 157-, 193- and 248-nm. It was found that quantum yield values were over a magnitude greater at EUV relative to optical wavelengths.
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|a Intel Corporation
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|a en_US
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|a Article
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|t Proceedings of SPIE--the International Society for Optical Engineering
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