Preserving nanoscale features in polymers during laser induced graphene formation using sequential infiltration synthesis

• Main Authors: Bergsman, David S. (Author), Getachew, Bezawit Asheber (Author), Grossman, Jeffrey C. (Author)
• Other Authors: Massachusetts Institute of Technology. Department of Materials Science and Engineering (Contributor), Massachusetts Institute of Technology. Research Laboratory of Electronics (Contributor)
• Format: Article
• Language: English
• Published: Springer Science and Business Media LLC, 2020-09-11T13:42:43Z.
• Subjects: Article
• Online Access: Get fulltext

Direct lasing of polymeric membranes to form laser induced graphene (LIG) offers a scalable and potentially cheaper alternative for the fabrication of electrically conductive membranes. However, the high temperatures induced during lasing can deform the substrate polymer, altering existing micro- and nanosized features that are crucial for a membrane's performance. Here, we demonstrate how sequential infiltration synthesis (SIS) of alumina, a simple solvent-free process, stabilizes polyethersulfone (PES) membranes against deformation above the polymers' glass transition temperature, enabling the formation of LIG without any changes to the membrane's underlying pore structure. These membranes are shown to have comparable sheet resistance to carbon-nanotube-composite membranes. They are electrochemically stable and maintain their permeability after lasing, demonstrating their competitive performance as electrically conductive membranes. These results demonstrate the immense versatility of SIS for modifying materials when combined with laser induced graphitization for a variety of applications.
National Science Foundation (U.S.) (Award 1541959)
National Science Foundation (U.S.). Graduate Research Fellowship Program (Grant DGE-1656518)