Design Optimization of Single-Layer Antireflective Coating for GaAs[subscript 1−x]xP[subscript x]x/Si Tandem Cells With x=0, 0.17, 0.29, and 0.37

• Main Authors: Abdul Hadi, Sabina (Author), Saylan, Sueda (Author), Dahlem, Marcus S. (Author), Nayfeh, Ammar (Author), Milakovich, Timothy J (Contributor), Bulsara, Mayank T (Contributor), Fitzgerald, Eugene A (Contributor)
• Other Authors: MIT Materials Research Laboratory (Contributor), Massachusetts Institute of Technology. Department of Materials Science and Engineering (Contributor)
• Format: Article
• Language: English
• Published: Institute of Electrical and Electronics Engineers (IEEE), 2017-05-02T16:24:39Z.
• Subjects: Article
• Online Access: Get fulltext

Single-layer antireflective coating (SLARC) materials and design for GaAs1_xPx/Si tandem cells were analyzed by TCAD simulation. We have shown that optimum SLARC thickness is a function of bandgap, thickness, and material quality of top GaAs1-xPx/Sisubcell. Cells are analyzed for P fractions x = 0, 0.17, 0.29, and 0.37, and ARC materials: Si3N4, SiO2 , ITO, 11fO2, and Al2O3. Optimum ARC thickness ranges from 65-75 nm for Si3N4 and ITO to ~100-110 nm for SiO2. Optimum ARC thickness increases with increasing GaAs1_xPx absorber layer thickness and with decreasing P fraction x. Simulations show that optimum GaAs1-xPx/Siabsorber layer thickness is not a strong function of ARC material, but it increases from 250 nm for x = 0 to1 μm for x = 0.29 and 0.37. For all P fractions, Si3N4, 11fO2, and Al2O3 performed almost equally, while SiO2 and ITO resulted in ~1% and ~2% lower efficiency, respectively. Optimum SLARC thickness increases as the material quality of the top cell increases. The effect of ARC material decreases with decreasing GaAs1_xPx material quality. The maximum efficiencies are achieved for cells with ~1-μm GaAs0.71P0.29 absorber (r = 10 ns): ~26.57% for 75-nm Si3N4 SLARC and 27.62% for 75-nm SiO2/60-nm Si3N4 double-layer ARC.
Masdar Institute of Science and Technology (Abu Dhabi, UAE)