Structural Properties and Sensing Performance of CeYxOy Sensing Films for Electrolyte–Insulator–Semiconductor pH Sensors

Abstract In this study we developed CeY x O y sensing membranes displaying super-Nernstian pH-sensitivity for use in electrolyte–insulator–semiconductor (EIS) pH sensors. We examined the effect of thermal annealing on the structural properties and sensing characteristics of the CeY x O y sensing mem...

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Main Authors: Tung-Ming Pan, Chih-Wei Wang, Ching-Yi Chen
Format: Article
Language:English
Published: Nature Publishing Group 2017-06-01
Series:Scientific Reports
Online Access:https://doi.org/10.1038/s41598-017-03209-7
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spelling doaj-ff467dd0d7a04bb1bc2570b75cf5e6072020-12-08T00:31:58ZengNature Publishing GroupScientific Reports2045-23222017-06-017111010.1038/s41598-017-03209-7Structural Properties and Sensing Performance of CeYxOy Sensing Films for Electrolyte–Insulator–Semiconductor pH SensorsTung-Ming Pan0Chih-Wei Wang1Ching-Yi Chen2Department of Electronics Engineering, Chang Gung UniversityDepartment of Electronics Engineering, Chang Gung UniversityDepartment of Electronics Engineering, Chang Gung UniversityAbstract In this study we developed CeY x O y sensing membranes displaying super-Nernstian pH-sensitivity for use in electrolyte–insulator–semiconductor (EIS) pH sensors. We examined the effect of thermal annealing on the structural properties and sensing characteristics of the CeY x O y sensing membranes deposited through reactive co-sputtering onto Si substrates. X-ray diffraction, atomic force microscopy, and X-ray photoelectron spectroscopy revealed the structural, morphological, and chemical features, respectively, of the CeY x O y films after their annealing at 600–900 °C. Among the tested systems, the CeY x O y EIS device prepared with annealing at 800 °C exhibited the highest sensitivity (78.15 mV/pH), the lowest hysteresis voltage (1.4 mV), and the lowest drift rate (0.85 mV/h). Presumably, these annealing conditions optimized the stoichiometry of (CeY)O2 in the film and its surface roughness while suppressing silicate formation at the CeY x O y –Si interface. We attribute the super-Nernstian pH-sensitivity to the incorporation of Y ions in the Ce framework, thereby decreasing the oxidation state Ce (Ce4+ → Ce3+) and resulting in less than one electron transferred per proton in the redox reaction.https://doi.org/10.1038/s41598-017-03209-7
collection DOAJ
language English
format Article
sources DOAJ
author Tung-Ming Pan
Chih-Wei Wang
Ching-Yi Chen
spellingShingle Tung-Ming Pan
Chih-Wei Wang
Ching-Yi Chen
Structural Properties and Sensing Performance of CeYxOy Sensing Films for Electrolyte–Insulator–Semiconductor pH Sensors
Scientific Reports
author_facet Tung-Ming Pan
Chih-Wei Wang
Ching-Yi Chen
author_sort Tung-Ming Pan
title Structural Properties and Sensing Performance of CeYxOy Sensing Films for Electrolyte–Insulator–Semiconductor pH Sensors
title_short Structural Properties and Sensing Performance of CeYxOy Sensing Films for Electrolyte–Insulator–Semiconductor pH Sensors
title_full Structural Properties and Sensing Performance of CeYxOy Sensing Films for Electrolyte–Insulator–Semiconductor pH Sensors
title_fullStr Structural Properties and Sensing Performance of CeYxOy Sensing Films for Electrolyte–Insulator–Semiconductor pH Sensors
title_full_unstemmed Structural Properties and Sensing Performance of CeYxOy Sensing Films for Electrolyte–Insulator–Semiconductor pH Sensors
title_sort structural properties and sensing performance of ceyxoy sensing films for electrolyte–insulator–semiconductor ph sensors
publisher Nature Publishing Group
series Scientific Reports
issn 2045-2322
publishDate 2017-06-01
description Abstract In this study we developed CeY x O y sensing membranes displaying super-Nernstian pH-sensitivity for use in electrolyte–insulator–semiconductor (EIS) pH sensors. We examined the effect of thermal annealing on the structural properties and sensing characteristics of the CeY x O y sensing membranes deposited through reactive co-sputtering onto Si substrates. X-ray diffraction, atomic force microscopy, and X-ray photoelectron spectroscopy revealed the structural, morphological, and chemical features, respectively, of the CeY x O y films after their annealing at 600–900 °C. Among the tested systems, the CeY x O y EIS device prepared with annealing at 800 °C exhibited the highest sensitivity (78.15 mV/pH), the lowest hysteresis voltage (1.4 mV), and the lowest drift rate (0.85 mV/h). Presumably, these annealing conditions optimized the stoichiometry of (CeY)O2 in the film and its surface roughness while suppressing silicate formation at the CeY x O y –Si interface. We attribute the super-Nernstian pH-sensitivity to the incorporation of Y ions in the Ce framework, thereby decreasing the oxidation state Ce (Ce4+ → Ce3+) and resulting in less than one electron transferred per proton in the redox reaction.
url https://doi.org/10.1038/s41598-017-03209-7
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