Through-hole energy-density threshold of silicon induced by combined millisecond and nanosecond pulsed laser

We report herein the experimental investigation of the through-hole energy-density threshold of silicon irradiated by a double-pulse laser. The double pulse consists of a 1 ms pulse and a time-delayed 5 ns pulse and is referred to as a combined-pulse laser (CPL). A modified level-set method is used...

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Bibliographic Details
Main Authors: Xueming Lv, Yunxiang Pan, Zhichao Jia, Zewen Li, Xiaowu Ni
Format: Article
Language:English
Published: AIP Publishing LLC 2018-05-01
Series:AIP Advances
Online Access:http://dx.doi.org/10.1063/1.5024607