Enhancement of Cleanliness and Deposition Rate by Understanding the Multiple Roles of the Showerhead Electrode in a Capacitively Coupled Plasma Reactor
Increasing the productivity of a showerhead-type capacitively coupled plasma (CCP) reactor requires an in-depth understanding of various physical phenomena related to the showerhead, which is not only responsible for gas distribution, but also acts as the electrode. Thus, we investigated how to enha...
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| Format: | Article |
| Language: | English |
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MDPI AG
2021-08-01
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| Series: | Coatings |
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| Online Access: | https://www.mdpi.com/2079-6412/11/8/999 |