| Summary: | Graphite is expected to be a common choice for basic microelectromechanical-system (MEMS) material in the future. However, in order to become a basic MEMS material, it is very important for graphite to be adapted to the commonly-used micro-/nanoprocessing technology. Therefore, this paper used a directly lithography and etching process to study micro-, /nanoprocessing on graphite. The results show that the graphite surface is suitable for lithography, and that different shapes and sizes of photoresist patterns can be directly fabricated on the graphite surface. In addition, the micro-meter height of photoresist could still resist plasma etching when process nanometers height of graphite structures. Therefore, graphite with photoresist patterns were directly processed by etching, and nanometer amounts of graphite were etched. Moreover, micro-/nanoscale graphite structure with height ranges from 29.4 nm−30.9 nm were fabricated with about 23° sidewall.
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