Simultaneous Analysis of Multi-Variables Effect on the Performance of Multi-Domain MFIS Negative Capacitance Field-Effect Transistors

With the simulation calibration for negative capacitor considering Landau model and multi-domain (MD) effect, MD MFIS negative capacitance field-effect transistor (NCFET) was thoroughly established for performing the simultaneous analysis of multi-variables (ferroelectric layer thickness (<inline...

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Main Authors: Guan-You He, Ming-Hao Li, Wei-Dong Liu, Lei-Ying Ying, Bao-Ping Zhang, Zhi-Wei Zheng, Chun-Hu Cheng
Format: Article
Language:English
Published: IEEE 2021-01-01
Series:IEEE Journal of the Electron Devices Society
Subjects:
Online Access:https://ieeexplore.ieee.org/document/9509401/
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spelling doaj-f993fec46e35492ea6801bb0f79e57532021-08-17T23:00:08ZengIEEEIEEE Journal of the Electron Devices Society2168-67342021-01-01974174710.1109/JEDS.2021.31035169509401Simultaneous Analysis of Multi-Variables Effect on the Performance of Multi-Domain MFIS Negative Capacitance Field-Effect TransistorsGuan-You He0Ming-Hao Li1Wei-Dong Liu2Lei-Ying Ying3Bao-Ping Zhang4https://orcid.org/0000-0001-9537-5179Zhi-Wei Zheng5https://orcid.org/0000-0002-9725-9566Chun-Hu Cheng6https://orcid.org/0000-0002-7995-4725School of Electronic Science and Engineering, Xiamen University, Xiamen, ChinaSchool of Electronic Science and Engineering, Xiamen University, Xiamen, ChinaSchool of Electronic Science and Engineering, Xiamen University, Xiamen, ChinaSchool of Electronic Science and Engineering, Xiamen University, Xiamen, ChinaSchool of Electronic Science and Engineering, Xiamen University, Xiamen, ChinaSchool of Electronic Science and Engineering, Xiamen University, Xiamen, ChinaDepartment of Mechatronic Engineering, National Taiwan Normal University, Taipei, TaiwanWith the simulation calibration for negative capacitor considering Landau model and multi-domain (MD) effect, MD MFIS negative capacitance field-effect transistor (NCFET) was thoroughly established for performing the simultaneous analysis of multi-variables (ferroelectric layer thickness (<inline-formula> <tex-math notation="LaTeX">${T} _{\mathrm{ FE}}$ </tex-math></inline-formula>), oxide layer thickness (<inline-formula> <tex-math notation="LaTeX">${T} _{\mathrm{ OX}}$ </tex-math></inline-formula>) and gate length (<inline-formula> <tex-math notation="LaTeX">${L} _{\mathrm{ g}}$ </tex-math></inline-formula>)) effect on the device performance. In this study, subthreshold swing (<italic>SS</italic>) and hysteresis properties of MD-MFIS-NCFET were demonstrated by employing TCAD simulation tool. Compared with the previous reported study on single variable effect based on single-domain (SD) NCFET, the simultaneous analysis of multi-variables effect on MD-NCFET enabled to obtain better device performance and generate more comprehensive results. Convincing models were established based on the experimental data by calibration. Demonstration on the basic simulated results including the lowering <italic>SS</italic> mechanism and the multi-variables effect on MD-NCFET performance was completely presented based on the capacitance matching theory and short channel effect. With the optimal <inline-formula> <tex-math notation="LaTeX">${T} _{\mathrm{ FE}}$ </tex-math></inline-formula> and <inline-formula> <tex-math notation="LaTeX">${T} _{\mathrm{ OX}}$ </tex-math></inline-formula>, a trade-off mechanism between the <italic>SS</italic> and <inline-formula> <tex-math notation="LaTeX">${L} _{\mathrm{ g}}$ </tex-math></inline-formula> was shown with the consideration of <inline-formula> <tex-math notation="LaTeX">${L} _{\mathrm{ g}}$ </tex-math></inline-formula> scaling. Noticeable in-depth study in association with the simultaneous analysis of the multi-variables effect was carried out, indicating that the hysteresis-free <italic>SS</italic> obtained by simultaneous analysis of multi-variables was lower than that obtained by single-variable analysis. Final validation results demonstrate that the optimization proposed in this work by considering the multi-variable effect shows high compatibility with other NCFET devices, providing an instructive strategy for the high-performance NCFET optimization.https://ieeexplore.ieee.org/document/9509401/NCFETcapacitance matchingmulti-domainTCAD
collection DOAJ
language English
format Article
sources DOAJ
author Guan-You He
Ming-Hao Li
Wei-Dong Liu
Lei-Ying Ying
Bao-Ping Zhang
Zhi-Wei Zheng
Chun-Hu Cheng
spellingShingle Guan-You He
Ming-Hao Li
Wei-Dong Liu
Lei-Ying Ying
Bao-Ping Zhang
Zhi-Wei Zheng
Chun-Hu Cheng
Simultaneous Analysis of Multi-Variables Effect on the Performance of Multi-Domain MFIS Negative Capacitance Field-Effect Transistors
IEEE Journal of the Electron Devices Society
NCFET
capacitance matching
multi-domain
TCAD
author_facet Guan-You He
Ming-Hao Li
Wei-Dong Liu
Lei-Ying Ying
Bao-Ping Zhang
Zhi-Wei Zheng
Chun-Hu Cheng
author_sort Guan-You He
title Simultaneous Analysis of Multi-Variables Effect on the Performance of Multi-Domain MFIS Negative Capacitance Field-Effect Transistors
title_short Simultaneous Analysis of Multi-Variables Effect on the Performance of Multi-Domain MFIS Negative Capacitance Field-Effect Transistors
title_full Simultaneous Analysis of Multi-Variables Effect on the Performance of Multi-Domain MFIS Negative Capacitance Field-Effect Transistors
title_fullStr Simultaneous Analysis of Multi-Variables Effect on the Performance of Multi-Domain MFIS Negative Capacitance Field-Effect Transistors
title_full_unstemmed Simultaneous Analysis of Multi-Variables Effect on the Performance of Multi-Domain MFIS Negative Capacitance Field-Effect Transistors
title_sort simultaneous analysis of multi-variables effect on the performance of multi-domain mfis negative capacitance field-effect transistors
publisher IEEE
series IEEE Journal of the Electron Devices Society
issn 2168-6734
publishDate 2021-01-01
description With the simulation calibration for negative capacitor considering Landau model and multi-domain (MD) effect, MD MFIS negative capacitance field-effect transistor (NCFET) was thoroughly established for performing the simultaneous analysis of multi-variables (ferroelectric layer thickness (<inline-formula> <tex-math notation="LaTeX">${T} _{\mathrm{ FE}}$ </tex-math></inline-formula>), oxide layer thickness (<inline-formula> <tex-math notation="LaTeX">${T} _{\mathrm{ OX}}$ </tex-math></inline-formula>) and gate length (<inline-formula> <tex-math notation="LaTeX">${L} _{\mathrm{ g}}$ </tex-math></inline-formula>)) effect on the device performance. In this study, subthreshold swing (<italic>SS</italic>) and hysteresis properties of MD-MFIS-NCFET were demonstrated by employing TCAD simulation tool. Compared with the previous reported study on single variable effect based on single-domain (SD) NCFET, the simultaneous analysis of multi-variables effect on MD-NCFET enabled to obtain better device performance and generate more comprehensive results. Convincing models were established based on the experimental data by calibration. Demonstration on the basic simulated results including the lowering <italic>SS</italic> mechanism and the multi-variables effect on MD-NCFET performance was completely presented based on the capacitance matching theory and short channel effect. With the optimal <inline-formula> <tex-math notation="LaTeX">${T} _{\mathrm{ FE}}$ </tex-math></inline-formula> and <inline-formula> <tex-math notation="LaTeX">${T} _{\mathrm{ OX}}$ </tex-math></inline-formula>, a trade-off mechanism between the <italic>SS</italic> and <inline-formula> <tex-math notation="LaTeX">${L} _{\mathrm{ g}}$ </tex-math></inline-formula> was shown with the consideration of <inline-formula> <tex-math notation="LaTeX">${L} _{\mathrm{ g}}$ </tex-math></inline-formula> scaling. Noticeable in-depth study in association with the simultaneous analysis of the multi-variables effect was carried out, indicating that the hysteresis-free <italic>SS</italic> obtained by simultaneous analysis of multi-variables was lower than that obtained by single-variable analysis. Final validation results demonstrate that the optimization proposed in this work by considering the multi-variable effect shows high compatibility with other NCFET devices, providing an instructive strategy for the high-performance NCFET optimization.
topic NCFET
capacitance matching
multi-domain
TCAD
url https://ieeexplore.ieee.org/document/9509401/
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