Study on the Properties of 1319 nm Ultra-High Reflector Deposited by Electron Beam Evaporation Assisted by an Energetic RF Ion Source

Study on the Properties of 1319 nm Ultra-High Reflector Deposited by Electron Beam Evaporation Assisted by an Energetic RF Ion Source

Ultra-high reflectors, working as a critical optical component, has been widely applied as a cavity mirror in fine optical systems such as laser gyro, F-P interferometer, etc. For decades, ion beam sputtering (IBS) technology, which can deposit ultra-low loss and dense layers, has been commonly beli...

Full description

Bibliographic Details
Main Authors: Songwen Deng, Gang Li, Feng Wang, Qipeng Lv, Long Sun, Yuqi Jin
Format: Article
Language:English
Published: MDPI AG 2018-02-01
Series:Coatings
Subjects:
electron beam evaporation
ultra-high reflector
ion source
Online Access:http://www.mdpi.com/2079-6412/8/2/74

Similar Items

Similar Items