The influence of deposition temperature on vanadium dioxide thin films microstructure and physical properties

Vanadium dioxide thin films were successfully prepared on soda lime glass substrates using the optimised conditions for r.f-inverted cylindrical magnetron sputtering. The optimised deposition parameters were fixed and then a systematic study of the effect of deposition temperature, ranging from 45...

Full description

Bibliographic Details
Main Authors: Velaphi Msomi, Oaisin Nemraoui
Format: Article
Language:English
Published: Academy of Science of South Africa 2010-11-01
Series:South African Journal of Science
Subjects:
Online Access:https://www.sajs.co.za/article/view/10102
Description
Summary:Vanadium dioxide thin films were successfully prepared on soda lime glass substrates using the optimised conditions for r.f-inverted cylindrical magnetron sputtering. The optimised deposition parameters were fixed and then a systematic study of the effect of deposition temperature, ranging from 450 °C to 550 °C, on the microstructure of thermochromic thin films was carried out. The deposited films were found to be well crystallised, showing strong texture corresponding to the (011) plane, indicating the presence of vanadium dioxide.
ISSN:1996-7489