Sputter Depth Profiling of Thin Films

Bibliographic Details
Main Author:	Hofmann, Siegfried
Format:	Article
Language:	English
Published:	De Gruyter 1998-01-01
Series:	High Temperature Materials and Processes
Online Access:	https://doi.org/10.1515/HTMP.1998.17.1-2.13

id	doaj-f870e6213e8d457ab0e3c05b20dd1cc3
record_format	Article
spelling	doaj-f870e6213e8d457ab0e3c05b20dd1cc32021-09-06T19:19:08ZengDe GruyterHigh Temperature Materials and Processes0334-64552191-03241998-01-01171-2132810.1515/HTMP.1998.17.1-2.13Sputter Depth Profiling of Thin FilmsHofmann, Siegfriedhttps://doi.org/10.1515/HTMP.1998.17.1-2.13
collection	DOAJ
language	English
format	Article
sources	DOAJ
author	Hofmann, Siegfried
spellingShingle	Hofmann, Siegfried Sputter Depth Profiling of Thin Films High Temperature Materials and Processes
author_facet	Hofmann, Siegfried
author_sort	Hofmann, Siegfried
title	Sputter Depth Profiling of Thin Films
title_short	Sputter Depth Profiling of Thin Films
title_full	Sputter Depth Profiling of Thin Films
title_fullStr	Sputter Depth Profiling of Thin Films
title_full_unstemmed	Sputter Depth Profiling of Thin Films
title_sort	sputter depth profiling of thin films
publisher	De Gruyter
series	High Temperature Materials and Processes
issn	0334-6455 2191-0324
publishDate	1998-01-01
url	https://doi.org/10.1515/HTMP.1998.17.1-2.13
work_keys_str_mv	AT hofmannsiegfried sputterdepthprofilingofthinfilms
_version_	1717779007735332864

Similar Items