In Situ Microgravimetric Study of Ion Exchanges in the Ternary Cu-In-S System Prepared by Atomic Layer Deposition
Reaction mechanisms during the growth of multinary compounds by atomic layer deposition can be complex, especially for sulfide materials. For instance, the deposition of copper indium disulfide (CuInS<sub>2</sub>) shows a non-direct correlation between the cycle ratio, the growth per cyc...
Main Authors: | Harold Le Tulzo, Nathanaelle Schneider, Frédérique Donsanti |
---|---|
Format: | Article |
Language: | English |
Published: |
MDPI AG
2020-02-01
|
Series: | Materials |
Subjects: | |
Online Access: | https://www.mdpi.com/1996-1944/13/3/645 |
Similar Items
-
Synthesis of indium oxi-sulfide films by atomic layer deposition: The essential role of plasma enhancement
by: Cathy Bugot, et al.
Published: (2013-11-01) -
An Overview of Atomic Layer Deposition Technique: Synthesis of ZnO, TiO2 and Al2O3 Films
by: Meryem POLAT GÖNÜLLÜ, et al.
Published: (2019-09-01) -
Atomic layer deposition on three dimensional silicon substrates for optical biosensors applications
by: Fedorenko, Viktoriia
Published: (2017) -
On the transformation of “zincone”-like into porous ZnO thin films from sub-saturated plasma enhanced atomic layer deposition
by: Alberto Perrotta, et al.
Published: (2019-03-01) -
Metal Fluorides as Lithium-Ion Battery Materials: An Atomic Layer Deposition Perspective
by: Miia Mäntymäki, et al.
Published: (2018-08-01)