Checkerboard Nanoplasmonic Gold Structure for Long-Wave Infrared Absorption Enhancement

A localized nanoplasmonic induced absorption enhancement in silicon nitride (Si<sub>3</sub>N<sub>4</sub>) dielectric material using a nanoscale novel checkerboard gold (Au) structure is demonstrated. The checkerboard structure is fabricated on a Si<sub>3</sub>N<...

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Bibliographic Details
Main Authors: Ehab Awad, Mohamed Abdel-Rahman, Muhammad Fakhar Zia
Format: Article
Language:English
Published: IEEE 2014-01-01
Series:IEEE Photonics Journal
Online Access:https://ieeexplore.ieee.org/document/6872517/
Description
Summary:A localized nanoplasmonic induced absorption enhancement in silicon nitride (Si<sub>3</sub>N<sub>4</sub>) dielectric material using a nanoscale novel checkerboard gold (Au) structure is demonstrated. The checkerboard structure is fabricated on a Si<sub>3</sub>N<sub>4</sub> layer using electron-beam lithography and sputter deposition techniques. The plasmonic electric field and optical absorption enhancement are measured using scanning near-field optical microscopy. Finite-difference time-domain simulations are utilized to characterize the absorption spectral response enhancement together with its dependence on incidence angle and polarization. The checkerboard shows a broadband average spectral absorption enhancement of 63.2% over the wavelength range 8-12 &#x03BC;m with a maximum enhancement of 107% at 8 &#x03BC;m and a minimum enhancement of 24.8% at 12 &#x03BC;m. The degradation of enhanced absorption with incidence angle variation (00-60&#x03BF;) is less than 1.6% at 10.6-&#x03BC;m wavelength. The checkerboard device shows polarization-independent absorption enhancement with incidence angles.
ISSN:1943-0655