Growth simulation of Cu columnar structures under oblique angle deposition and Monte Carlo random walks
In this simulation model, oblique angle deposition method and Monte Carlo random walks have been used. Growth model was ballistic deposition (BD). Incident particles flux comes to substrate at an angle with respect to normal. Two physical factors including self-shadowing and mobility limitation of i...
| Main Authors: | , |
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| Format: | Article |
| Language: | English |
| Published: |
Isfahan University of Technology
2013-10-01
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| Series: | Iranian Journal of Physics Research |
| Subjects: | |
| Online Access: | http://ijpr.iut.ac.ir/browse.php?a_code=A-10-1130-3&slc_lang=en&sid=1 |