Growth of CaxCoO2 Thin Films by A Two-Stage Phase Transformation from CaO–CoO Thin Films Deposited by Rf-Magnetron Reactive Cosputtering

• Main Authors: Biplab Paul, Jun Lu, Per Eklund
• Format: Article
• Language: English
• Published: MDPI AG 2019-03-01
• Series: Nanomaterials
• Subjects: thin film; nanostructure; CaxCoO2; sputtering; phase transformation
• Online Access: http://www.mdpi.com/2079-4991/9/3/443

The layered cobaltates AxCoO2 (A: alkali metals and alkaline earth metals) are of interest in the area of energy harvesting and electronic applications, due to their good electronic and thermoelectric properties. However, their future widespread applicability depends on the simplicity and cost of the growth technique. Here, we have investigated the sputtering/annealing technique for the growth of CaxCoO2 (x = 0.33) thin films. In this approach, CaO–CoO film is first deposited by rf-magnetron reactive cosputtering from metallic targets of Ca and Co. Second, the as-deposited film is reactively annealed under O2 gas flow to form the final phase of CaxCoO2. The advantage of the present technique is that, unlike conventional sputtering from oxide targets, the sputtering is done from the metallic targets of Ca and Co; thus, the deposition rate is high. Furthermore, the composition of the film is controllable by controlling the power at the targets.