Evolution of defect formation during atomically precise desulfurization of monolayer MoS2
Desulfurization of MoS2 alters its chemical and physical properties by breaking structural symmetry. Here, the atomic-scale mechanistic pathway by which this occurs is investigated during plasma etching, and changes in chemical structure and physical properties are revealed.
Main Authors: | Jong-Young Lee, Jong Hun Kim, Yeonjoon Jung, June Chul Shin, Yangjin Lee, Kwanpyo Kim, Namwon Kim, Arend M. van der Zande, Jangyup Son, Gwan-Hyoung Lee |
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Format: | Article |
Language: | English |
Published: |
Nature Publishing Group
2021-07-01
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Series: | Communications Materials |
Online Access: | https://doi.org/10.1038/s43246-021-00185-4 |
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