Evolution of defect formation during atomically precise desulfurization of monolayer MoS2

Evolution of defect formation during atomically precise desulfurization of monolayer MoS2

Desulfurization of MoS2 alters its chemical and physical properties by breaking structural symmetry. Here, the atomic-scale mechanistic pathway by which this occurs is investigated during plasma etching, and changes in chemical structure and physical properties are revealed.

Bibliographic Details
Main Authors: Jong-Young Lee, Jong Hun Kim, Yeonjoon Jung, June Chul Shin, Yangjin Lee, Kwanpyo Kim, Namwon Kim, Arend M. van der Zande, Jangyup Son, Gwan-Hyoung Lee
Format: Article
Language:English
Published: Nature Publishing Group 2021-07-01
Series:Communications Materials
Online Access:https://doi.org/10.1038/s43246-021-00185-4
Description
Summary:Desulfurization of MoS2 alters its chemical and physical properties by breaking structural symmetry. Here, the atomic-scale mechanistic pathway by which this occurs is investigated during plasma etching, and changes in chemical structure and physical properties are revealed.
ISSN:2662-4443

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