Direct Correlation of Ferroelectric Properties and Memory Characteristics in Ferroelectric Tunnel Junctions
Ferroelectric memories have made big advancements in the last years due to the discovery of ferroelectricity in already widely used hafnium oxide. Here we investigate ferroelectric tunnel junctions (FTJ) consisting of a ferroelectric hafnium zirconium oxide layer and a dielectric aluminum oxide laye...
| Main Authors: | , , , |
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| Format: | Article |
| Language: | English |
| Published: |
IEEE
2019-01-01
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| Series: | IEEE Journal of the Electron Devices Society |
| Subjects: | |
| Online Access: | https://ieeexplore.ieee.org/document/8782578/ |