Wet chemical thinning of molybdenum disulfide down to its monolayer

We report on the preparation of mono- and bi-layer molybdenum disulfide (MoS2) from a bulk crystal by facile wet chemical etching. We show that concentrated nitric acid (HNO3) effectively etches thin MoS2 crystals from their edges via formation of MoO3. Interestingly, etching of thin crystals on a s...

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Main Authors:	Kiran Kumar Amara, Leiqiang Chu, Rajeev Kumar, Minglin Toh, Goki Eda
Format:	Article
Language:	English
Published:	AIP Publishing LLC 2014-09-01
Series:	APL Materials
Online Access:	http://dx.doi.org/10.1063/1.4893962

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spelling	doaj-e98c94a765d749e98ba00e3d176db19b2020-11-24T21:17:49ZengAIP Publishing LLCAPL Materials2166-532X2014-09-0129092509092509-710.1063/1.4893962012492APMWet chemical thinning of molybdenum disulfide down to its monolayerKiran Kumar Amara0Leiqiang Chu1Rajeev Kumar2Minglin Toh3Goki Eda4Department of Chemistry, National University of Singapore, 3 Science Drive 3, Singapore 117543Department of Physics, National University of Singapore, 2 Science Drive 3, Singapore 117551Department of Physics, National University of Singapore, 2 Science Drive 3, Singapore 117551Department of Physics, National University of Singapore, 2 Science Drive 3, Singapore 117551Department of Chemistry, National University of Singapore, 3 Science Drive 3, Singapore 117543We report on the preparation of mono- and bi-layer molybdenum disulfide (MoS2) from a bulk crystal by facile wet chemical etching. We show that concentrated nitric acid (HNO3) effectively etches thin MoS2 crystals from their edges via formation of MoO3. Interestingly, etching of thin crystals on a substrate leaves behind unreacted mono- and bilayer sheets. The flakes obtained by chemical etching exhibit electronic quality comparable to that of mechanically exfoliated counterparts. Our findings indicate that the self-limiting chemical etching is a promising top-down route to preparing atomically thin crystals from bulk layer compounds.http://dx.doi.org/10.1063/1.4893962
collection	DOAJ
language	English
format	Article
sources	DOAJ
author	Kiran Kumar Amara Leiqiang Chu Rajeev Kumar Minglin Toh Goki Eda
spellingShingle	Kiran Kumar Amara Leiqiang Chu Rajeev Kumar Minglin Toh Goki Eda Wet chemical thinning of molybdenum disulfide down to its monolayer APL Materials
author_facet	Kiran Kumar Amara Leiqiang Chu Rajeev Kumar Minglin Toh Goki Eda
author_sort	Kiran Kumar Amara
title	Wet chemical thinning of molybdenum disulfide down to its monolayer
title_short	Wet chemical thinning of molybdenum disulfide down to its monolayer
title_full	Wet chemical thinning of molybdenum disulfide down to its monolayer
title_fullStr	Wet chemical thinning of molybdenum disulfide down to its monolayer
title_full_unstemmed	Wet chemical thinning of molybdenum disulfide down to its monolayer
title_sort	wet chemical thinning of molybdenum disulfide down to its monolayer
publisher	AIP Publishing LLC
series	APL Materials
issn	2166-532X
publishDate	2014-09-01
description	We report on the preparation of mono- and bi-layer molybdenum disulfide (MoS2) from a bulk crystal by facile wet chemical etching. We show that concentrated nitric acid (HNO3) effectively etches thin MoS2 crystals from their edges via formation of MoO3. Interestingly, etching of thin crystals on a substrate leaves behind unreacted mono- and bilayer sheets. The flakes obtained by chemical etching exhibit electronic quality comparable to that of mechanically exfoliated counterparts. Our findings indicate that the self-limiting chemical etching is a promising top-down route to preparing atomically thin crystals from bulk layer compounds.
url	http://dx.doi.org/10.1063/1.4893962
work_keys_str_mv	AT kirankumaramara wetchemicalthinningofmolybdenumdisulfidedowntoitsmonolayer AT leiqiangchu wetchemicalthinningofmolybdenumdisulfidedowntoitsmonolayer AT rajeevkumar wetchemicalthinningofmolybdenumdisulfidedowntoitsmonolayer AT minglintoh wetchemicalthinningofmolybdenumdisulfidedowntoitsmonolayer AT gokieda wetchemicalthinningofmolybdenumdisulfidedowntoitsmonolayer
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Wet chemical thinning of molybdenum disulfide down to its monolayer

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