Electrical description of an inductively coupled plasma processing reactor with discharge parameters calculated from a global model
A commercial inductively coupled plasma processing reactor is modeled by an equivalent electrical circuit combined with a global model, which calculates the electron temperature and the plasma density for Ar discharges at the pressures of 15 mTorr and 30 mTorr. Based on the transformer model, a refi...
| Main Authors: | , , , |
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| Format: | Article |
| Language: | English |
| Published: |
AIP Publishing LLC
2020-03-01
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| Series: | AIP Advances |
| Online Access: | http://dx.doi.org/10.1063/1.5145296 |