Study of damage profiles and energy calculation of arsenic ions during ion implantation on Germanium

Study of damage profiles and energy calculation of arsenic ions during ion implantation on Germanium

Bibliographic Details
Main Author: K Giri
Format: Article
Language:English
Published: Department of Physics, Mahendra Morang Adarsh Multiple Campus, Tribhuvan University 2020-01-01
Series:Bibechana
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spelling doaj-e61a671cd3d24a92ad72eaa1df1d12e42020-11-25T01:37:57ZengDepartment of Physics, Mahendra Morang Adarsh Multiple Campus, Tribhuvan UniversityBibechana2091-07622382-53402020-01-01https://doi.org/10.3126/bibechana.v17i0.26521Study of damage profiles and energy calculation of arsenic ions during ion implantation on GermaniumK Giri
collection DOAJ
language English
format Article
sources DOAJ
author K Giri
spellingShingle K Giri
Study of damage profiles and energy calculation of arsenic ions during ion implantation on Germanium
Bibechana
author_facet K Giri
author_sort K Giri
title Study of damage profiles and energy calculation of arsenic ions during ion implantation on Germanium
title_short Study of damage profiles and energy calculation of arsenic ions during ion implantation on Germanium
title_full Study of damage profiles and energy calculation of arsenic ions during ion implantation on Germanium
title_fullStr Study of damage profiles and energy calculation of arsenic ions during ion implantation on Germanium
title_full_unstemmed Study of damage profiles and energy calculation of arsenic ions during ion implantation on Germanium
title_sort study of damage profiles and energy calculation of arsenic ions during ion implantation on germanium
publisher Department of Physics, Mahendra Morang Adarsh Multiple Campus, Tribhuvan University
series Bibechana
issn 2091-0762
2382-5340
publishDate 2020-01-01
work_keys_str_mv AT kgiri studyofdamageprofilesandenergycalculationofarsenicionsduringionimplantationongermanium
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