Caracterización estructural mediante elipsometría espectral de multicapas basadas en SiO<sub>2</sub>

We have characterised PECVD-grown non-stoichiometric silicon oxides (SiOx) and thick waveguide structures based on these materials with spectroscopic ellipsometry. We have developed a fit method that allows detailed analysis of complicated ellipsometric spectra, such as those of thick (~10 μm) multi...

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Bibliographic Details
Main Authors: Alonso, M. I., Garriga, M.
Format: Article
Language:English
Published: Elsevier 2000-12-01
Series:Boletín de la Sociedad Española de Cerámica y Vidrio
Subjects:
Online Access:http://ceramicayvidrio.revistas.csic.es/index.php/ceramicayvidrio/article/view/773/801

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