MBE growth of high electron mobility 2DEGs in AlGaN/GaN heterostructures controlled by RHEED
We have grown 2DEG AlGaN/GaN heterostructures by molecular beam epitaxy (MBE) with electron mobilities up to 21500 cm2V−1s−1 at 2 K. In-situ RHEED was applied to optimize different aspects of Ga-rich growth. This paper gives a compact overview of the experimental key aspects that significantly affec...
Main Authors: | D. Broxtermann, M. Sivis, J. Malindretos, A. Rizzi |
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Format: | Article |
Language: | English |
Published: |
AIP Publishing LLC
2012-03-01
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Series: | AIP Advances |
Online Access: | http://dx.doi.org/10.1063/1.3679149 |
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