MBE growth of high electron mobility 2DEGs in AlGaN/GaN heterostructures controlled by RHEED

We have grown 2DEG AlGaN/GaN heterostructures by molecular beam epitaxy (MBE) with electron mobilities up to 21500 cm2V−1s−1 at 2 K. In-situ RHEED was applied to optimize different aspects of Ga-rich growth. This paper gives a compact overview of the experimental key aspects that significantly affec...

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Bibliographic Details
Main Authors: D. Broxtermann, M. Sivis, J. Malindretos, A. Rizzi
Format: Article
Language:English
Published: AIP Publishing LLC 2012-03-01
Series:AIP Advances
Online Access:http://dx.doi.org/10.1063/1.3679149

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