Patterning technology for solution-processed organic crystal field-effect transistors

Organic field-effect transistors (OFETs) are fundamental building blocks for various state-of-the-art electronic devices. Solution-processed organic crystals are appreciable materials for these applications because they facilitate large-scale, low-cost fabrication of devices with high performance. P...

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Main Authors: Yun Li, Huabin Sun, Yi Shi, Kazuhito Tsukagoshi
Format: Article
Language:English
Published: Taylor & Francis Group 2014-04-01
Series:Science and Technology of Advanced Materials
Online Access:http://dx.doi.org/10.1088/1468-6996/15/2/024203
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spelling doaj-d803eb2f76a441c097d29c68893bd8df2020-11-24T22:36:41ZengTaylor & Francis GroupScience and Technology of Advanced Materials1468-69961878-55142014-04-0115202420310.1088/1468-6996/15/2/024203Patterning technology for solution-processed organic crystal field-effect transistors Yun LiHuabin SunYi ShiKazuhito TsukagoshiOrganic field-effect transistors (OFETs) are fundamental building blocks for various state-of-the-art electronic devices. Solution-processed organic crystals are appreciable materials for these applications because they facilitate large-scale, low-cost fabrication of devices with high performance. Patterning organic crystal transistors into well-defined geometric features is necessary to develop these crystals into practical semiconductors. This review provides an update on recent development in patterning technology for solution-processed organic crystals and their applications in field-effect transistors. Typical demonstrations are discussed and examined. In particular, our latest research progress on the spin-coating technique from mixture solutions is presented as a promising method to efficiently produce large organic semiconducting crystals on various substrates for high-performance OFETs. This solution-based process also has other excellent advantages, such as phase separation for self-assembled interfaces via one-step spin-coating, self-flattening of rough interfaces, and in situ purification that eliminates the impurity influences. Furthermore, recommendations for future perspectives are presented, and key issues for further development are discussed.http://dx.doi.org/10.1088/1468-6996/15/2/024203
collection DOAJ
language English
format Article
sources DOAJ
author Yun Li
Huabin Sun
Yi Shi
Kazuhito Tsukagoshi
spellingShingle Yun Li
Huabin Sun
Yi Shi
Kazuhito Tsukagoshi
Patterning technology for solution-processed organic crystal field-effect transistors
Science and Technology of Advanced Materials
author_facet Yun Li
Huabin Sun
Yi Shi
Kazuhito Tsukagoshi
author_sort Yun Li
title Patterning technology for solution-processed organic crystal field-effect transistors
title_short Patterning technology for solution-processed organic crystal field-effect transistors
title_full Patterning technology for solution-processed organic crystal field-effect transistors
title_fullStr Patterning technology for solution-processed organic crystal field-effect transistors
title_full_unstemmed Patterning technology for solution-processed organic crystal field-effect transistors
title_sort patterning technology for solution-processed organic crystal field-effect transistors
publisher Taylor & Francis Group
series Science and Technology of Advanced Materials
issn 1468-6996
1878-5514
publishDate 2014-04-01
description Organic field-effect transistors (OFETs) are fundamental building blocks for various state-of-the-art electronic devices. Solution-processed organic crystals are appreciable materials for these applications because they facilitate large-scale, low-cost fabrication of devices with high performance. Patterning organic crystal transistors into well-defined geometric features is necessary to develop these crystals into practical semiconductors. This review provides an update on recent development in patterning technology for solution-processed organic crystals and their applications in field-effect transistors. Typical demonstrations are discussed and examined. In particular, our latest research progress on the spin-coating technique from mixture solutions is presented as a promising method to efficiently produce large organic semiconducting crystals on various substrates for high-performance OFETs. This solution-based process also has other excellent advantages, such as phase separation for self-assembled interfaces via one-step spin-coating, self-flattening of rough interfaces, and in situ purification that eliminates the impurity influences. Furthermore, recommendations for future perspectives are presented, and key issues for further development are discussed.
url http://dx.doi.org/10.1088/1468-6996/15/2/024203
work_keys_str_mv AT yunli patterningtechnologyforsolutionprocessedorganiccrystalfieldeffecttransistors
AT huabinsun patterningtechnologyforsolutionprocessedorganiccrystalfieldeffecttransistors
AT yishi patterningtechnologyforsolutionprocessedorganiccrystalfieldeffecttransistors
AT kazuhitotsukagoshi patterningtechnologyforsolutionprocessedorganiccrystalfieldeffecttransistors
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