Synthesis of Silica Membranes by Chemical Vapor Deposition Using a Dimethyldimethoxysilane Precursor

Synthesis of Silica Membranes by Chemical Vapor Deposition Using a Dimethyldimethoxysilane Precursor

Silica-based membranes prepared by chemical vapor deposition of tetraethylorthosilicate (TEOS) on γ-alumina overlayers are known to be effective for hydrogen separation and are attractive for membrane reactor applications for hydrogen-producing reactions. In this study, the synthesis of the...

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Bibliographic Details
Main Authors: S. Ted Oyama, Haruki Aono, Atsushi Takagaki, Takashi Sugawara, Ryuji Kikuchi
Format: Article
Language:English
Published: MDPI AG 2020-03-01
Series:Membranes
Subjects:
silica-alumina membrane
dimethyldimethoxysilane (dmdmos)
hydrothermal stability
chemical vapor deposition
gamma-alumina intermediate layers
hydrogen helium separation
Online Access:https://www.mdpi.com/2077-0375/10/3/50

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https://www.mdpi.com/2077-0375/10/3/50

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