Oxygen source-oriented control of atmospheric pressure chemical vapor deposition of VO2 for capacitive applications

• Main Authors: Dimitra Vernardou, Antonia Bei, Dimitris Louloudakis, Nikolaos Katsarakis, Emmanouil Koudoumas
• Format: Article
• Language: English
• Published: International Association of Physical Chemists (IAPC) 2016-06-01
• Series: Journal of Electrochemical Science and Engineering
• Subjects: Atmospheric pressure chemical vapor deposition; O2 source; Vanadium dioxide; Electrochemical properties.
• Online Access: http://pub.iapchem.org/ojs/index.php/JESE/article/view/278

Vanadium dioxides of different crystalline orientation planes have successfully been fabricated by chemical vapor deposition at atmospheric pressure using propanol, ethanol and O2 gas as oxygen sources. The thick a-axis textured monoclinic vanadium dioxide obtained through propanol presented the best electrochemical response in terms of the highest specific discharge capacity of 459 mAh g-1 with a capacitance retention of 97 % after 1000 scans under constant specific current of 2 A g-1. Finally, the electrochemical impedance spectroscopy indicated that the charge transfer of Li+ through the vanadium dioxide / electrolyte interface was easier for this sample enhancing significantly its capacitance performance.