Effects of Ion Beam Etching on the Nanoscale Damage Precursor Evolution of Fused Silica

Effects of Ion Beam Etching on the Nanoscale Damage Precursor Evolution of Fused Silica

Nanoscale laser damage precursors generated from fabrication have emerged as a new bottleneck that limits the laser damage resistance improvement of fused silica optics. In this paper, ion beam etching (IBE) technology is performed to investigate the evolutions of some nanoscale damage precursors (s...

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Bibliographic Details
Main Authors: Yaoyu Zhong, Yifan Dai, Feng Shi, Ci Song, Ye Tian, Zhifan Lin, Wanli Zhang, Yongxiang Shen
Format: Article
Language:English
Published: MDPI AG 2020-03-01
Series:Materials
Subjects:
fused silica
ion beam etching
nanoscale defect
laser damage resistance
surface quality
Online Access:https://www.mdpi.com/1996-1944/13/6/1294

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