Forward Current Transport Properties of AlGaN/GaN Schottky Diodes Prepared by Atomic Layer Deposition

Atomic layer deposited AlGaN on GaN substrate with different thicknesses was prepared and the electron transport mechanism of AlGaN/GaN Schottky diodes was investigated. Above 348 K, both 5 and 10 nm thick AlGaN showed that the thermionic emission model with inhomogeneous Schottky barrier could expl...

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Bibliographic Details
Main Authors: Hogyoung Kim, Seok Choi, Byung Joon Choi
Format: Article
Language:English
Published: MDPI AG 2020-02-01
Series:Coatings
Subjects:
Online Access:https://www.mdpi.com/2079-6412/10/2/194