Effects of Different Amounts of Nb Doping on Electrical, Optical and Structural Properties in Sputtered TiO<sub>2−x</sub> Films

Effects of Different Amounts of Nb Doping on Electrical, Optical and Structural Properties in Sputtered TiO<sub>2−x</sub> Films

Highly conductive TiO<sub>2</sub> films with different Nb doping levels (up to 5 at%) were prepared by reactive DC magnetron sputtering under precise control of the oxygen partial pressure. They were deposited on unheated substrates, covered with a protective Si<sub>3</sub>N&...

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Bibliographic Details
Main Authors: Daniel Dorow-Gerspach, Dieter Mergel, Matthias Wuttig
Format: Article
Language:English
Published: MDPI AG 2021-03-01
Series:Crystals
Subjects:
Nb doping
titanium dioxide
electrical properties
anatase
reactive sputtering
transparent conducting oxide
Online Access:https://www.mdpi.com/2073-4352/11/3/301

Internet

https://www.mdpi.com/2073-4352/11/3/301

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